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Conference Paper
Conference on Lasers and Electro-Optics
San Jose, California United States
May 4-9, 2008
ISBN: 978-1-55752-859-9
Nano- and Micro-Processing of Materials with Femtosecond Laser Pulses (CMX)

Extreme Ultraviolet Interferometric Lithography with a Desk-Top System

Przemyslaw W. Wachulak, Mario C. Marconi, Willie Rockward, David Hill, Erik H. Anderson, Carmen S. Menoni, and Jorge J. Rocca

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We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub- 100nm feature size.

© 2008 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(340.0340) X-ray optics : X-ray optics
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(220.4241) Optical design and fabrication : Nanostructure fabrication

P. W. Wachulak, M. C. Marconi, W. Rockward, D. Hill, E. H. Anderson, C. S. Menoni, and J. J. Rocca, "Extreme Ultraviolet Interferometric Lithography with a Desk-Top System," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optical Society of America, 2008), paper CMX5.

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