3D Nanoscale Pattern Formation in Porous Silicon

Ik Su Chun; Edmond K. Chow; Xiuling Li

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper CWO3

3D Nanoscale Pattern Formation in Porous Silicon

Ik Su Chun, Edmond K. Chow, and Xiuling Li

Conference on Lasers and Electro-Optics 2008

San Jose, California United States
4–9 May 2008
ISBN: 978-1-55752-859-9

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3-D Structuring of Photonic Crystals (CWO)

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I. S. Chun, E. K. Chow, and X. Li, "3D Nanoscale Pattern Formation in Porous Silicon," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper CWO3.

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Abstract

A simple and effective processing technique for 3D nanoscale pattern formation in light emitting porous silicon is reported. The technique is based on metal assisted chemical etching and defined by the 2D nanoscale metal pattern.

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