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Conference Paper
Conference on Lasers and Electro-Optics
Baltimore, Maryland United States
May 31, 2009 - June 5, 2009
ISBN: 978-1-55752-869-8
Ultrafast and Short Wavelength Technology (JFA)

13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization

Fernando Brizuela, Yong Wang, Courtney A. Brewer, Francesco Pedaci, Weilun Chao, Erik H. Anderson, Yanwei Liu, Kenneth A. Goldberg, Patrick Naulleau, Przemyslaw Wachulak, Mario C. Marconi, David T. Attwood, Jorge J. Rocca, and Carmen S. Menoni

http://dx.doi.org/10.1364/CLEO.2009.JFA5


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Abstract

We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55±3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.

© 2009 The Optical Society

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(110.7440) Imaging systems : X-ray imaging
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers

Citation
F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference, OSA Technical Digest (CD) (Optical Society of America, 2009), paper JFA5.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2009-JFA5

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