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Conference Paper
Conference on Lasers and Electro-Optics
Baltimore, Maryland United States
May 31, 2009 - June 5, 2009
ISBN: 978-1-55752-869-8
Ultrafast and Short Wavelength Technology (JFA)

Coherent Imaging Nano-Patterning with Extreme Ultraviolet Laser Illumination

Artak Isoyan, Fan Jian, Yang-Chun Cheng, Przemyslaw Wachulak, Lukasz Urbanski, Jorge Rocca, Carmen Menoni, Mario C. Marconi, and Franco Cerrina

http://dx.doi.org/10.1364/CLEO.2009.JFA7


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Abstract

We present a high resolution extreme ultraviolet patterning approach based on Talbot self imaging and holographic projection imaging using for illumination a table top extreme ultraviolet laser.

© 2009 The Optical Society

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(110.7440) Imaging systems : X-ray imaging
(340.0340) X-ray optics : X-ray optics
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

Citation
A. Isoyan, F. Jian, Y. Cheng, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, M. C. Marconi, and F. Cerrina, "Coherent Imaging Nano-Patterning with Extreme Ultraviolet Laser Illumination," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference, OSA Technical Digest (CD) (Optical Society of America, 2009), paper JFA7.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2009-JFA7


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