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Conference Paper
CLEO: Science and Innovations
Baltimore, Maryland United States
May 1-6, 2011
ISBN: 978-1-55752-910-7
Fabrication and Characterization of Nano Plasmonic Devices (CMV)

Nano-scale Strain Mapping using Near-field Spectroscopy

Antonio Llopis, Sergio Pereira, Ian M. Watson, Arkadii Krokhin, and A. Neogi  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_SI.2011.CMV6


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Abstract

A technique is presented for mapping the strain in light-emitting nano- and hetero-structures using near-field spectroscopy. This technique makes use of theoretical calculations to extract the strain from near-field data.

© 2011 OSA

OCIS Codes
(300.6470) Spectroscopy : Spectroscopy, semiconductors
(180.4243) Microscopy : Near-field microscopy
(250.5590) Optoelectronics : Quantum-well, -wire and -dot devices

Citation
A. Llopis, S. Pereira, I. M. Watson, A. Krokhin, and A. Neogi, "Nano-scale Strain Mapping using Near-field Spectroscopy," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optical Society of America, 2011), paper CMV6.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_SI-2011-CMV6


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