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Conference Paper
CLEO: Science and Innovations
Baltimore, Maryland United States
May 1-6, 2011
ISBN: 978-1-55752-910-7
Nanophotonics and Integration Joint Poster Session (JTuI)

Strained Germanium Membrane using Thin Film Stressor for High Efficiency Laser

Donguk Nam, Arunanshu Roy, Kevin Huang, Mark Brongersma, and Krishna Saraswat  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_AT.2011.JTuI85


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Abstract

A novel method to introduce more than 0.6% biaxial tensile strain and achieve a 60meV direct band gap reduction in epitaxially grown germanium is demonstrated. Possible applications include high efficiency germanium lasers on silicon substrates.

© 2011 OSA

OCIS Codes
(160.3380) Materials : Laser materials
(310.6860) Thin films : Thin films, optical properties
(250.5960) Optoelectronics : Semiconductor lasers

Citation
D. Nam, A. Roy, K. Huang, M. Brongersma, and K. Saraswat, "Strained Germanium Membrane using Thin Film Stressor for High Efficiency Laser," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optical Society of America, 2011), paper JTuI85.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_SI-2011-JTuI85


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