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Conference Paper
CLEO: Applications and Technology
Baltimore, Maryland United States
May 1-6, 2011
ISBN: 978-1-55752-910-7
Nanophotonics and Integration Joint Poster Session (JTuI)

Resonant in-situ photoluminescence of Si-QDs buried in SiOx/SiNx distributed Bragg reflector

Chung-Lun Wu, Yung-Hsiang Lin, and Gong-Ru Lin  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_AT.2011.JTuI15


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Abstract

A 20-pair SiOx/SiNx:Si-QDs distributed Bragg reflector with in-situ Si-QDs contributed photoluminescence at 667nm is demonstrated to shrink the Si-QDs emission linewidth from 140 to 19 nm and enhance its intensity by 37.4 times.

© 2011 OSA

OCIS Codes
(250.5230) Optoelectronics : Photoluminescence
(160.4236) Materials : Nanomaterials

Citation
C. Wu, Y. Lin, and G. Lin, "Resonant in-situ photoluminescence of Si-QDs buried in SiOx/SiNx distributed Bragg reflector," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optical Society of America, 2011), paper JTuI15.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_AT-2011-JTuI15


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