We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.
© 2012 OSA
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(220.4241) Optical design and fabrication : Nanostructure fabrication
L. Urbanski, A. Isoyan, A. Stein, J. Rocca, C. Menoni, and M. Marconi, "Defect Tolerant Extreme Ultraviolet Lithography," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper AW1H.5.
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