OSA's Digital Library

Optics InfoBase > Conference Papers > CLEO_AT > 2012 > AW1H > Page AW1H.5 © 2012 OSA

Conference Paper
CLEO: Applications and Technology
San Jose, California United States
May 6-11, 2012
ISBN: 978-1-55752-943-5
Advanced Fabrication & Characterization Technologies (AW1H)

Defect Tolerant Extreme Ultraviolet Lithography

Lukasz Urbanski, Artak Isoyan, Aaron Stein, Jorge Rocca, Carmen Menoni, and Mario Marconi  »View Author Affiliations


View Full Text Article

Acrobat PDF (841 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.

© 2012 OSA

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(220.4241) Optical design and fabrication : Nanostructure fabrication

L. Urbanski, A. Isoyan, A. Stein, J. Rocca, C. Menoni, and M. Marconi, "Defect Tolerant Extreme Ultraviolet Lithography," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper AW1H.5.

Sort:  Journal  |  Reset


References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited