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Optics InfoBase > Conference Papers > CLEO_AT > 2012 > AW1H > Page AW1H.5 © 2012 OSA

Conference Paper
CLEO: Applications and Technology
San Jose, California United States
May 6-11, 2012
ISBN: 978-1-55752-943-5
Advanced Fabrication & Characterization Technologies (AW1H)

Defect Tolerant Extreme Ultraviolet Lithography

Lukasz Urbanski, Artak Isoyan, Aaron Stein, Jorge Rocca, Carmen Menoni, and Mario Marconi  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_AT.2012.AW1H.5


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Abstract

We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.

© 2012 OSA

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(220.4241) Optical design and fabrication : Nanostructure fabrication

Citation
L. Urbanski, A. Isoyan, A. Stein, J. Rocca, C. Menoni, and M. Marconi, "Defect Tolerant Extreme Ultraviolet Lithography," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper AW1H.5.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_AT-2012-AW1H.5


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