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Conference Paper
CLEO: Applications and Technology
San Jose, California United States
May 6-11, 2012
ISBN: 978-1-55752-943-5
Poster Session I (JW2A)

Fabrication of Thin Metallic-film Subwavelength-Grating Polarizers for Terahertz Region by the Imprinting Method

Kazuo Shiraishi, Misako Kofuji, Yuta Inagawa, Hidehiko Yoda, and Chen S. Tsai  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_AT.2012.JW2A.45


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Abstract

Fabrication of metallic-film subwavelength-grating polarizers is simplified by employing the imprinting technique. The extinction ratio of polarizers fabricated is 45dB together with an insertion loss lower than 0.5dB at around 2.3THz.

© 2012 OSA

OCIS Codes
(230.5440) Optical devices : Polarization-selective devices
(300.6495) Spectroscopy : Spectroscopy, teraherz
(050.6624) Diffraction and gratings : Subwavelength structures

Citation
K. Shiraishi, M. Kofuji, Y. Inagawa, H. Yoda, and C. S. Tsai, "Fabrication of Thin Metallic-film Subwavelength-Grating Polarizers for Terahertz Region by the Imprinting Method," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper JW2A.45.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_AT-2012-JW2A.45


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