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Conference Paper
CLEO: QELS_Fundamental Science
San Jose, California United States
June 9-14, 2013
ISBN: 978-1-55752-972-5
POSTER SESSION II: Energy, Sensing, and Nonlinear Optics (JW2A)

Spontaneous and induced optical absorption in ultra-low loss amorphous Ta2O5 and SiO2 dielectric thin films

Ashot Markosyan, Roger Route, Martin Fejer, Dinesh Patel, and Carmen Menoni  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_AT.2013.JW2A.54


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Abstract

The optical absorption @1064 nm in Ta2O5 and SiO2 thin films is affected with simultaneous illumination ranging from 266 to 780 nm. The effect is attributed to filling of trap states in the forbidden gap.

© 2013 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(160.4760) Materials : Optical properties
(310.6860) Thin films : Thin films, optical properties

Citation
A. Markosyan, R. Route, M. Fejer, D. Patel, and C. Menoni, "Spontaneous and induced optical absorption in ultra-low loss amorphous Ta2O5 and SiO2 dielectric thin films," in CLEO: 2013, OSA Technical Digest (online) (Optical Society of America, 2013), paper JW2A.54.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_QELS-2013-JW2A.54


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