Spectrally Selective Chiral Silicon Metasurfaces Based on Infrared Fano Resonances

Chihhui Wu; Nihal Arju; Jonathan Fan; Igal Brener; Igal Brener; Gennady Shvets

doi:10.1364/CLEO_QELS.2014.FF2C.1

CLEO: 2014
OSA Technical Digest (online) (Optica Publishing Group, 2014),
paper FF2C.1
•https://doi.org/10.1364/CLEO_QELS.2014.FF2C.1

Spectrally Selective Chiral Silicon Metasurfaces Based on Infrared Fano Resonances

Chihhui Wu, Nihal Arju, Jonathan Fan, Igal Brener, and Gennady Shvets

CLEO: QELS_Fundamental Science 2014

San Jose, California United States
8–13 June 2014
ISBN: 978-1-55752-999-2

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Metasurfaces II (FF2C)

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C. Wu, N. Arju, J. Fan, I. Brener, and G. Shvets, "Spectrally Selective Chiral Silicon Metasurfaces Based on Infrared Fano Resonances," in CLEO: 2014, OSA Technical Digest (online) (Optica Publishing Group, 2014), paper FF2C.1.

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Abstract

Silicon-process compatible metasurface was designed and tested in the infrared wavelength range. These metasurfaces show very high Q (>100), extreme chirality, and polarization conversion along with very low-loss operation. They show promise for sensing applications as well as spectrally selective CP thermal emitters.

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