A novel concept for enhancing the photon-extraction efficiency of nanophotonics structures is presented. We apply in-situ electron beam lithography to enhance the single photon flux of single quantum dots by deterministically aligned microlenses.
© 2014 OSA
M. Gschrey, M. Seifried, L. Krüger, R. Schmidt, J. Schulze, T. Heindel, S. Burger, S. Rodt, F. Schmidt, A. Strittmatter, and S. Reitzenstein, "Boosting the photon-extraction efficiency of nanophotonic structures by deterministic microlenses," in CLEO: 2014, OSA Technical Digest (online) (Optical Society of America, 2014), paper FF2K.2.
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