We present direct imprinting of porous substrates (DIPS) as a strategy for nanoscaled (<100nm) patterning of porous nanomaterials. DIPS is further investigated as a low-cost technique for fabricating structures for enhanced light-matter interaction.
© 2011 OSA
(220.3740) Optical design and fabrication : Lithography
(220.4241) Optical design and fabrication : Nanostructure fabrication
(280.4788) Remote sensing and sensors : Optical sensing and sensors
J. D. Ryckman, M. Liscidini, J. E. Sipe, and S. M. Weiss, "Direct Imprinting of Porous Substrates," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optical Society of America, 2011), paper CMEE3.
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