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Optics InfoBase > Conference Papers > CLEO_SI > 2011 > CMEE > Page CMEE3 © 2011 OSA

Conference Paper
CLEO: Science and Innovations
Baltimore, Maryland United States
May 1-6, 2011
ISBN: 978-1-55752-910-7
Novel Nanofabrication Concepts (CMEE)

Direct Imprinting of Porous Substrates

Judson D. Ryckman, Marco Liscidini, J. E. Sipe, and Sharon M. Weiss  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_SI.2011.CMEE3


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Abstract

We present direct imprinting of porous substrates (DIPS) as a strategy for nanoscaled (<100nm) patterning of porous nanomaterials. DIPS is further investigated as a low-cost technique for fabricating structures for enhanced light-matter interaction.

© 2011 OSA

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(220.4241) Optical design and fabrication : Nanostructure fabrication
(280.4788) Remote sensing and sensors : Optical sensing and sensors

Citation
J. D. Ryckman, M. Liscidini, J. E. Sipe, and S. M. Weiss, "Direct Imprinting of Porous Substrates," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optical Society of America, 2011), paper CMEE3.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_SI-2011-CMEE3


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