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Conferences > CLEO_SI > 2011 > CMEE > CMEE4

Talbot Effect: A Venerable Idea with New Applications in Nanofabrication

L. Urbanski, P. Wachulak, A. Isoyan, A. Stein, C. S. Menoni, J. Rocca, and M. Marconi

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Abstract

We describe a coherent nanolithography approach using the Talbot effect in combination with a table top EUV laser emitting at 46.9 nm. The method was used to print large areas of periodic features with nanometer resolution.

© 2011 Optical Society of America

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