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Conference Paper
CLEO: Science and Innovations
Baltimore, Maryland United States
May 1-6, 2011
ISBN: 978-1-55752-910-7
3D Nano Fabrication (CML)

Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon

Tobias Grossmann, Simone Schleede, Mario Hauser, Torsten Beck, Michael Thiel, Georg von Freymann, Timo Mappes, and Heinz Kalt  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_SI.2011.CML6


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Abstract

We report on the planar and three-dimensional (3D) lithographic fabrication and optical characterization of microcavity lasers made of dye doped polymers with laser thresholds as low as 3 nJ per pulse at visible wavelengths.

© 2011 OSA

OCIS Codes
(160.5470) Materials : Polymers
(220.4000) Optical design and fabrication : Microstructure fabrication
(140.3945) Lasers and laser optics : Microcavities

Citation
T. Grossmann, S. Schleede, M. Hauser, T. Beck, M. Thiel, G. von Freymann, T. Mappes, and H. Kalt, "Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optical Society of America, 2011), paper CML6.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_SI-2011-CML6


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