OSA's Digital Library

Optics InfoBase > Conference Papers > CLEO_SI > 2012 > CM4L > Page CM4L.1 © 2012 OSA

Conference Paper
CLEO: Science and Innovations
San Jose, California United States
May 6-11, 2012
ISBN: 978-1-55752-943-5
Advances in Nanofabrication for Photonics (CM4L)

Depletion Mechanisms in STED-inspired Lithography

Joachim Fischer, Thomas J. Wolf, Andreas-Neil Unterreiner, and Martin Wegener  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_SI.2012.CM4L.1


View Full Text Article

Acrobat PDF (1499 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations
  • Export Citation/Save Click for help

Abstract

Direct laser writing optical lithography using light-induced depletion allows for fabricating structures beyond the diffraction limit. We investigate the depletion mechanisms of the photoinitiator DETC aiming at optimizing future photoresists.

© 2012 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(220.3740) Optical design and fabrication : Lithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

Citation
J. Fischer, T. J. Wolf, A. Unterreiner, and M. Wegener, "Depletion Mechanisms in STED-inspired Lithography," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper CM4L.1.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_SI-2012-CM4L.1


Sort:  Journal  |  Reset

References

References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited