Direct laser writing optical lithography using light-induced depletion allows for fabricating structures beyond the diffraction limit. We investigate the depletion mechanisms of the photoinitiator DETC aiming at optimizing future photoresists.
© 2012 OSA
J. Fischer, T. J. Wolf, A. Unterreiner, and M. Wegener, "Depletion Mechanisms in STED-inspired Lithography," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper CM4L.1.
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