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Conference Paper
CLEO: Science and Innovations
San Jose, California United States
May 6-11, 2012
ISBN: 978-1-55752-943-5
Advances in Nanofabrication for Photonics (CM4L)

Depletion Mechanisms in STED-inspired Lithography

Joachim Fischer, Thomas J. Wolf, Andreas-Neil Unterreiner, and Martin Wegener  »View Author Affiliations


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Direct laser writing optical lithography using light-induced depletion allows for fabricating structures beyond the diffraction limit. We investigate the depletion mechanisms of the photoinitiator DETC aiming at optimizing future photoresists.

© 2012 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(220.3740) Optical design and fabrication : Lithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

J. Fischer, T. J. Wolf, A. Unterreiner, and M. Wegener, "Depletion Mechanisms in STED-inspired Lithography," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper CM4L.1.

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