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Optics InfoBase > Conference Papers > CLEO_SI > 2012 > JW4A > Page JW4A.10 © 2012 OSA

Conference Paper
CLEO: Science and Innovations
San Jose, California United States
May 6-11, 2012
ISBN: 978-1-55752-943-5
Poster Session II (JW4A)

High Coupling Efficiency Etched Facet Tapers in Silicon

Jaime Cardenas, Kevin Luke, Lian Wee Luo, Carl B. Poitras, Paul A. Morton, and Michal Lipson  »View Author Affiliations


http://dx.doi.org/10.1364/CLEO_AT.2012.JW4A.10


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Abstract

We demonstrate etched facet silicon inverse tapers with coupling loss as low as 0.7dB per facet. This taper can be fabricated on a wafer scale enabling mass-production of silicon photonic devices with broadband, high-efficiency couplers.

© 2012 OSA

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.7370) Optical devices : Waveguides
(250.5300) Optoelectronics : Photonic integrated circuits

Citation
J. Cardenas, K. Luke, L. W. Luo, C. B. Poitras, P. A. Morton, and M. Lipson, "High Coupling Efficiency Etched Facet Tapers in Silicon," in Conference on Lasers and Electro-Optics 2012, OSA Technical Digest (online) (Optical Society of America, 2012), paper JW4A.10.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO_SI-2012-JW4A.10

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