Single-pulse (532 nm, 10 ns) micropatterning of silicon surfaces through a pinhole is demonstrated using scanning electron and atomic force microscopy. The results are compared to the Fresnel diffraction theory and physical mechanisms are discussed.
© 2014 OSA
G. Mecalco, C. Acosta-Zepeda, J. L. Hernandez-Pozos, N. Batina, I. Morales-Reyes, J. Bonse, and E. Haro-Poniatowski, "Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation," in CLEO: 2014, OSA Technical Digest (online) (Optical Society of America, 2014), paper SF1J.3.
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