We investigate the achievable fidelity of line patterns produced by iterative and analytically derived computer generated holographic photomasks for the fabrication of microelectronic circuits by photolithographic exposure. Metrics for comparison are given.
© 2009 The Optical Society
R. McWilliam, A. Purvis, G. L. Williams, J. Toriz-Garcia, L. N. Seed, and P. A. Ivey, "High Fidelity Microlithography Patterning Using Computer Generated Holograms," in Advances in Imaging, OSA Technical Digest (CD) (Optical Society of America, 2009), paper DWB28.
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