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Conference Paper
Digital Holography and Three-Dimensional Imaging
Vancouver Canada
April 26-30, 2009
ISBN: 978-1-55752-871-1
DH Poster Session (DWB)

High Fidelity Microlithography Patterning Using Computer Generated Holograms

Richard McWilliam, Alan Purvis, Gavin L. Williams, Jesus Toriz-Garcia, Luke N. Seed, and Peter A. Ivey

http://dx.doi.org/10.1364/DH.2009.DWB28


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Abstract

We investigate the achievable fidelity of line patterns produced by iterative and analytically derived computer generated holographic photomasks for the fabrication of microelectronic circuits by photolithographic exposure. Metrics for comparison are given.

© 2009 The Optical Society

OCIS Codes
(090.0090) Holography : Holography
(090.1760) Holography : Computer holography
(110.0110) Imaging systems : Imaging systems
(110.5220) Imaging systems : Photolithography

Citation
R. McWilliam, A. Purvis, G. L. Williams, J. Toriz-Garcia, L. N. Seed, and P. A. Ivey, "High Fidelity Microlithography Patterning Using Computer Generated Holograms," in Advances in Imaging, OSA Technical Digest (CD) (Optical Society of America, 2009), paper DWB28.
http://www.opticsinfobase.org/abstract.cfm?URI=DH-2009-DWB28


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