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Conference Paper
Diffractive Optics and Micro-Optics
Québec City Canada
June 18, 2000
ISBN: 1-55752-635-4
Theory 1 (DMA)

Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study

Hiroyuki Ichikawa and Hisao Kikuta


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No abstract available.

OCIS Codes
(050.1220) Diffraction and gratings : Apertures
(220.3740) Optical design and fabrication : Lithography

H. Ichikawa and H. Kikuta, "Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study," in Diffractive Optics and Micro-Optics , T. Li, ed., Vol. 41 of OSA Trends in Optics and Photonics (Optical Society of America, 2000), paper DMA5.

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