Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study

Hiroyuki Ichikawa; Hisao Kikuta

doi:10.1364/DOMO.2000.DMA5

Diffractive Optics and Micro-Optics
OSA Trends in Optics and Photonics (Optica Publishing Group, 2000),
paper DMA5
•https://doi.org/10.1364/DOMO.2000.DMA5

Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study

Hiroyuki Ichikawa and Hisao Kikuta

Diffractive Optics and Micro-Optics 2000

Québec City Canada
18–22 June 2000
ISBN: 1-55752-635-4

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H. Ichikawa and H. Kikuta, "Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study," in Diffractive Optics and Micro-Optics , T. Li, ed., Vol. 41 of OSA Trends in Optics and Photonics (Optica Publishing Group, 2000), paper DMA5.

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Abstract

Diffraction of light by a single aperture of subwavelength size into lossy media is numerically investigated. The results suggest possibility of fabrication of subwavelength diffractive optical elements by conventional contact or proximity lithography with thin resist layer.

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