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Conference Paper
Diffractive Optics and Micro-Optics
Tucson, Arizona United States
June 3, 2002
ISBN: 1-55752-710-5
Micro Optics-Joint Session with IODC (JWA)

Aberration measurement of photolithographic lenses using hybrid diffractive photo-masks

Eric Johnson, Jinwon Sung, and Mahesh Pitchumani


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No abstract available.

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.5220) Imaging systems : Photolithography

E. Johnson, J. Sung, and M. Pitchumani, "Aberration measurement of photolithographic lenses using hybrid diffractive photo-masks," in Diffractive Optics and Micro-Optics, R. Magnusson, ed., Vol. 75 of OSA Trends in Optics and Photonics Series (Optical Society of America, 2002), paper JWA3.

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