A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis (RCWA) is applied to determine the optimum profiles of right-angle-face anisotropically etched silicon (Si) gratings. The sensitivities of the optimized profiles are presented.
© 2005 Optical Society of America
S. Wu, T. K. Gaylord, J. S. Maikisch, and E. N. Glytsis, "Optimization of Anisotropically Etched Silicon Surface-Relief Gratings for Substrate-Mode Optical Interconnects," in Frontiers in Optics, OSA Technical Digest Series (Optical Society of America, 2005), paper FWL3.
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