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Conference Paper
Frontiers in Optics
Tucson, Arizona United States
October 16-21, 2005
ISBN: 1-55752-797-0
Passive Photonics I (FWL)

Optimization of Anisotropically Etched Silicon Surface-Relief Gratings for Substrate-Mode Optical Interconnects

Shun-Der Wu, Thomas K. Gaylord, Jonathan S. Maikisch, and Elias N. Glytsis

http://dx.doi.org/10.1364/FIO.2005.FWL3


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Abstract

A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis (RCWA) is applied to determine the optimum profiles of right-angle-face anisotropically etched silicon (Si) gratings. The sensitivities of the optimized profiles are presented.

© 2005 Optical Society of America

OCIS Codes
(040.6040) Detectors : Silicon
(050.1950) Diffraction and gratings : Diffraction gratings
(130.0130) Integrated optics : Integrated optics

Citation
S. Wu, T. K. Gaylord, J. S. Maikisch, and E. N. Glytsis, "Optimization of Anisotropically Etched Silicon Surface-Relief Gratings for Substrate-Mode Optical Interconnects," in Frontiers in Optics, OSA Technical Digest Series (Optical Society of America, 2005), paper FWL3.
http://www.opticsinfobase.org/abstract.cfm?URI=FiO-2005-FWL3


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