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Conference Paper
Frontiers in Optics
Rochester, New York United States
October 10, 2006
ISBN: 1-55752-818-7
Diffractive Micro- and Nanostructures for Sensing and Information Processing I (FMC)

A Far-Field Implementation of Near-Field Phase-Shift Lithography Using Diffractive Optical Elements

Wei-Feng Hsu and Yuan-Hong Su

http://dx.doi.org/10.1364/FIO.2006.FMC4


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Abstract

We present a lithographic technique where a diffractive optical element of a Fourier system generated a diffractive pattern. It resembled the near-field pattern of a phase-shift mask that has been used to create subwavelength features.

© 2006 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1380) Diffraction and gratings : Binary optics
(050.5080) Diffraction and gratings : Phase shift

Citation
W. Hsu and Y. Su, "A Far-Field Implementation of Near-Field Phase-Shift Lithography Using Diffractive Optical Elements," in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2006), paper FMC4.
http://www.opticsinfobase.org/abstract.cfm?URI=FiO-2006-FMC4


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