We present a lithographic technique where a diffractive optical element of a Fourier system generated a diffractive pattern. It resembled the near-field pattern of a phase-shift mask that has been used to create subwavelength features.
© 2006 Optical Society of America
W. Hsu and Y. Su, "A Far-Field Implementation of Near-Field Phase-Shift Lithography Using Diffractive Optical Elements," in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2006), paper FMC4.
References are not available for this paper.