We designed and fabricated a deep-etched subwavelength fused silica grating for polarization separation, which has etched depth of 2.0μm and period of 890nm, for polarization efficiency >80% and polarization isolation >50 for wavelength at 1550nm.
© 2007 Optical Society of America
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.2770) Diffraction and gratings : Gratings
(230.0230) Optical devices : Optical devices
(230.5440) Optical devices : Polarization-selective devices
C. Zhou, B. Wang, J. Feng, and H. Ru, "Deep-Etched Grating for Polarization Separation," in Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion, OSA Technical Digest (CD) (Optical Society of America, 2007), paper FThV7.
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