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Conference Paper
Frontiers in Optics
Rochester, New York United States
October 19-23, 2008
ISBN: 978-1-55752-861-2
Optics and Instrumentation for Next-Generation Sources II (FWU)

EUV Spectroscopy of Tin-Doped Laser Plasma Sources

Reuvani D. Kamtaprasad, Robert T. Bernath, Kazutoshi Takenoshita, Simi George, and Martin C. Richardson

http://dx.doi.org/10.1364/FIO.2008.FWU4


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Abstract

Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser plasmas were completed using a combination of spectroscopic instruments that allow for quantitative spectroscopy throughout the radiation region of 5-550 nm.

© 2008 The Optical Society

OCIS Codes
(040.0040) Detectors : Detectors
(040.7480) Detectors : X-rays, soft x-rays, extreme ultraviolet (EUV)
(300.0300) Spectroscopy : Spectroscopy
(300.6540) Spectroscopy : Spectroscopy, ultraviolet

Citation
R. D. Kamtaprasad, R. T. Bernath, K. Takenoshita, S. George, and M. C. Richardson, "EUV Spectroscopy of Tin-Doped Laser Plasma Sources," in Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing, OSA Technical Digest (CD) (Optical Society of America, 2008), paper FWU4.
http://www.opticsinfobase.org/abstract.cfm?URI=FiO-2008-FWU4


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