Abstract
The paper presents a method of using scanning near-field optical microscopy (SNOM) to measure the optical power loss of embedded waveguides. Experiment results and theoretical analysis show that the method can give more accurate loss measurement than the traditional far-field approaches. In addition, the proposed method provides a means to measure other parameters characterizing the manufacturing quality of waveguides can be obtained as well. The experimental results tally with the theory studies.
© 2008 Optical Society of America
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