Post-annealing of HfO<sup>2</sup>and SiO<sup>2</sup>thin films affects the absorption loss at 1 ?m, and the subpicosecond laser breakdown. These effects are explained by modifications in the density of intrinsic defects and photo-induced defects respectively.
© 2009 OSA
P. Langston, D. Pate, A. Markosyan, E. Krous, D. Nguyen, L. Emmert, W. Rudolph, R. Route, M. Fejer, M. Shinn, and C. Menoni, "Modifications in the Optical Properties of Thin Film Oxides with Annealing," in Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest, OSA Technical Digest (CD) (Optical Society of America, 2009), paper FThS7.
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