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Conference Paper
Frontiers in Optics
San Jose, California United States
October 11-15, 2009
ISBN: 978-1-55752-878-0
Negative Index Materials and Cloaking (FTuN)

Mixing Plasmonic Cloaking with Second-Order Optical Nonlinearity

Uday Chettiar and Nader Engheta


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Using plasmonic cloaks around second-order nonlinear optical materials, we theoretically show that relative values of second-harmonic induced dipoles can be enhanced as compared with uncloaked scenarios, while having relatively low scattering at the fundamental frequency.

© 2009 OSA

OCIS Codes
(160.0160) Materials : Materials
(160.4670) Materials : Optical materials
(160.3918) Materials : Metamaterials

U. Chettiar and N. Engheta, "Mixing Plasmonic Cloaking with Second-Order Optical Nonlinearity," in Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest, OSA Technical Digest (CD) (Optical Society of America, 2009), paper FTuN7.

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