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Conference Paper
Frontiers in Optics
San Jose, California United States
October 11-15, 2009
ISBN: 978-1-55752-878-0
FiO/LS Joint Poster Session (JWC)

Accurate Measurement of Refractive Indices of Optical Wafers by Using Fabry-Perot Type Interference

Hee Joo Choi, Hwan Hong Lim, In-Ho Bae, Han Seb Moon, Myoungsik Cha, Tae Bong Eom, and Jung Jin Ju

http://dx.doi.org/10.1364/FIO.2009.JWC11


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Abstract

We investigated Fabry-Perot type interference from optical wafers to measure the refractive indices. This method is accurate (~10<sup>-5</sup>for fused silica), insensitive to environmental perturbation, and simple to implement, compared to the conventional index-measurement methods.

© 2009 OSA

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5710) Instrumentation, measurement, and metrology : Refraction

Citation
H. J. Choi, H. H. Lim, I. Bae, H. S. Moon, M. Cha, T. B. Eom, and J. J. Ju, "Accurate Measurement of Refractive Indices of Optical Wafers by Using Fabry-Perot Type Interference," in Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest, OSA Technical Digest (CD) (Optical Society of America, 2009), paper JWC11.
http://www.opticsinfobase.org/abstract.cfm?URI=FiO-2009-JWC11


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