Multi-beam-interference lithography parameters are systematically analyzed and optimized. High absolute contrast and a variety of point geometries ranging from elliptical to rectilinear or rhombic intensity profiles are demonstrated.
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(350.0350) Other areas of optics : Other areas of optics
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
G. M. Burrow and T. K. Gaylord, "Constrained Parametric Optimization of Point Geometries in Multi-Beam-Interference Lithography," in Frontiers in Optics 2010/Laser Science XXVI, OSA Technical Digest (CD) (Optical Society of America, 2010), paper FWS3.
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