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Conference Paper
Frontiers in Optics
Rochester, New York United States
October 24-28, 2010
Nanopatterning and meta-materials (FWS)

Constrained Parametric Optimization of Point Geometries in Multi-Beam-Interference Lithography

Guy M. Burrow and Thomas K. Gaylord

http://dx.doi.org/10.1364/FIO.2010.FWS3


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Abstract

Multi-beam-interference lithography parameters are systematically analyzed and optimized. High absolute contrast and a variety of point geometries ranging from elliptical to rectilinear or rhombic intensity profiles are demonstrated.

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(350.0350) Other areas of optics : Other areas of optics
(350.4238) Other areas of optics : Nanophotonics and photonic crystals

Citation
G. M. Burrow and T. K. Gaylord, "Constrained Parametric Optimization of Point Geometries in Multi-Beam-Interference Lithography," in Frontiers in Optics 2010/Laser Science XXVI, OSA Technical Digest (CD) (Optical Society of America, 2010), paper FWS3.
http://www.opticsinfobase.org/abstract.cfm?URI=FiO-2010-FWS3


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