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Conference Paper
Frontiers in Optics
San Jose, California United States
October 16-20, 2011
ISBN: 978-1-55752-917-6
Three-Dimensional Structure Design, Fabrication, and Nanopatterning II (FTuM)

Beyond the Rayleigh Limit in Optical Lithography

M. Suhail Zubairy  »View Author Affiliations


http://dx.doi.org/10.1364/FIO.2011.FTuM1


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Abstract

It is well known that the precision with which a pattern could be etched in interference lithography is limited by the wavelength of the light. In this talk we shall discuss several schemes for sub-wavelength lithography using classical light.

© 2011 OSA

OCIS Codes
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

Citation
M. S. Zubairy, "Beyond the Rayleigh Limit in Optical Lithography," in Frontiers in Optics 2011/Laser Science XXVII, OSA Technical Digest (Optical Society of America, 2011), paper FTuM1.
http://www.opticsinfobase.org/abstract.cfm?URI=FiO-2011-FTuM1


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