It is well known that the precision with which a pattern could be etched in interference lithography is limited by the wavelength of the light. In this talk we shall discuss several schemes for sub-wavelength lithography using classical light.
© 2011 OSA
M. S. Zubairy, "Beyond the Rayleigh Limit in Optical Lithography," in Frontiers in Optics 2011/Laser Science XXVII, OSA Technical Digest (Optical Society of America, 2011), paper FTuM1.
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