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Conference Paper
Frontiers in Optics
San Jose, California United States
October 16-20, 2011
ISBN: 978-1-55752-917-6
General Optical Design and Instrumentation II (FWZ)

Interference Projection Exposure System

Guy M. Burrow and Thomas K. Gaylord  »View Author Affiliations


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An interference projection exposure system is presented for single-exposure fabrication of low-spatial-frequency functional elements in a high-spatial-frequency, all-surrounding periodic pattern. Photonic crystal devices are demonstrated.

© 2011 OSA

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(110.4235) Imaging systems : Nanolithography
(230.5298) Optical devices : Photonic crystals

G. M. Burrow and T. K. Gaylord, "Interference Projection Exposure System," in Frontiers in Optics 2011/Laser Science XXVII, OSA Technical Digest (Optical Society of America, 2011), paper FWZ2.

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