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Perfluoropolyether-Based Hydrophobic AFM Tips Fabricated by Two-Photon Polymerization

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Abstract

Two-photon polymerization technology is used to fabricate atomic force microscopy tips with tailorable geometry and chemical properties. In particular, hydrophobic and chemically resistant tips for optimized wet imaging are manufactured in a perfluoropolyether-based resist.

© 2014 Optical Society of America

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