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Conference Paper
International Optical Design Conference
Vancouver Canada
June 4, 2006
ISBN: 1-55752-811-X
Infrared and Lithographic Design and Systems (WD)

Extreme Ring Fields in Microlithography

Alexander Epple

http://dx.doi.org/10.1364/IODC.2006.WD3


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Abstract

A new inline catadioptric design type is presented which is designed for use with extreme ring field geometries. This allows to increase the numerical aperture to the physical limits both in dry and immersion lithography.

© 2006 Optical Society of America

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(110.3960) Imaging systems : Microlithography
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3620) Optical design and fabrication : Lens system design

Citation
A. Epple, "Extreme Ring Fields in Microlithography," in International Optical Design, Technical Digest (CD) (Optical Society of America, 2006), paper WD3.
http://www.opticsinfobase.org/abstract.cfm?URI=IODC-2006-WD3


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