A new inline catadioptric design type is presented which is designed for use with extreme ring field geometries. This allows to increase the numerical aperture to the physical limits both in dry and immersion lithography.
© 2006 Optical Society of America
(110.0110) Imaging systems : Imaging systems
(110.3960) Imaging systems : Microlithography
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3620) Optical design and fabrication : Lens system design
A. Epple, "Extreme Ring Fields in Microlithography," in International Optical Design, Technical Digest (CD) (Optical Society of America, 2006), paper WD3.
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