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Conference Paper
International Optical Design Conference
Jackson Hole, Wyoming United States
June 13-17, 2010
ISBN: 978-1-55752-893-3
Polarization in Optical Design (IWA)

Low Polarization Microscope Objectives

Brian J. Daugherty and Russell Chipman

http://dx.doi.org/10.1364/IODC.2010.IWA2


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Abstract

Microscope objectives used for biaxial ellipsometry require small levels of polarization aberrations. The approach outlined in this paper allows the design and fabrication of microscope objectives with twelve times less diattenuation than commercially available objectives.

© 2010 OSA, SPIE

OCIS Codes
(310.0310) Thin films : Thin films
(310.1210) Thin films : Antireflection coatings
(310.5448) Thin films : Polarization, other optical properties

Citation
B. J. Daugherty and R. Chipman, "Low Polarization Microscope Objectives," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optical Society of America, 2010), paper IWA2.
http://www.opticsinfobase.org/abstract.cfm?URI=IODC-2010-IWA2


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