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Conference Paper
International Optical Design Conference
Jackson Hole, Wyoming United States
June 13-17, 2010
ISBN: 978-1-55752-893-3
Polarization in Optical Design (IWA)

Challenges for Polarization Ray Tracing

Russell A. Chipman

http://dx.doi.org/10.1364/IODC.2010.IWA4


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Abstract

New polarization methods allow the ray tracing simulation of polarization critical components, including multilayer biaxial films, anisotropic and gyrotropic crystals, electro-optical, magneto-optical, and stressoptical modulators, photonic crystals and meta-materials.

© 2010 OSA, SPIE

OCIS Codes
(160.0160) Materials : Materials
(160.1190) Materials : Anisotropic optical materials
(260.0260) Physical optics : Physical optics
(260.5430) Physical optics : Polarization

Citation
R. A. Chipman, "Challenges for Polarization Ray Tracing," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optical Society of America, 2010), paper IWA4.
http://www.opticsinfobase.org/abstract.cfm?URI=IODC-2010-IWA4


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