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Toward the Global Optimum in Lithographic Lens Design

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Abstract

Significant advances have been made in recent years in the development of the lithography optics. The resolution of the structures below 45 nm demanded a new class of catadioptric objective lenses whose design and construction is the result of decades of development in lithography optics. This article describes the best performing lens types and design principles of the catadioptric concept of these lenses.

© 2010 OSA, SPIE

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