Abstract

In this paper, we discuss fabrication processes implemented for the realization of micron-sized and submicron-sized patterns in lithium niobate for application to nanophotonics or phononics. FIB milling as well as collective processes based on reactive ion etching in fluorine chemistries and their use for the fabrication of photonic and phononic crystal structures is illustrated. We will discuss the limitations of both methods and see how they can affect the actual physical performance of the fabricated devices.

© 2012 Optical Society of America