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Conferences > IPR > 2003 > ITuC > ITuC4

Oxidation Kinetics of Waveguide Roughness Minimization in Silicon Microphotonics

Daniel K. Sparacin, Kazumi Wada, and Lionel C. Kimerling

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Abstract

Waveguide roughness at the core/cladding interface causes severe signal attenuation in silicon waveguide systems. In this study, the smoothing kinetics of the roughness are simulated using TSUPREME4 and measured by AFM. As anticipated, we find that small period roughness is reduced faster than long period roughness. Simultaneously, we unexpectedly observe saturation in the oxidation smoothing kinetics.

© 2003 Optical Society of America

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