3D direct-write waveguides in diffusion photopolymers

Matthew W. Grabowski; Amy C. Sullivan; Robert R. McLeod

doi:10.1364/IPRA.2006.ITuD5

Integrated Photonics Research and Applications/Nanophotonics
Technical Digest (CD) (Optica Publishing Group, 2006),
paper ITuD5
•https://doi.org/10.1364/IPRA.2006.ITuD5

3D direct-write waveguides in diffusion photopolymers

Matthew W. Grabowski, Amy C. Sullivan, and Robert R. McLeod

Integrated Photonics Research and Applications 2006

Uncasville, Connecticut United States
24–26 April 2006
ISBN:

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Polymer Devices II (ITuD)

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M. W. Grabowski, A. C. Sullivan, and R. R. McLeod, "3D direct-write waveguides in diffusion photopolymers," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optica Publishing Group, 2006), paper ITuD5.

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Abstract

Three-dimensional direct-write lithography can be used to pattern waveguides into diffusion photopolymer using low-power CW lasers as an alternative to femtosecond writing in glass. We show that polymer chemistry permits significant control of waveguide shape.

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