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Conference Paper
Integrated Photonics Research and Applications
Uncasville, Connecticut United States
April 24, 2006
Silica and Silicon Devices III (IWA)

A Shallow-Etched Distributed-Grating Wavelength Demultiplexer in SOI

Eric Bisaillon, Dan T. Tan, Jacques Laniel, Aju Jugessur, Lukas Chrostowski, and Andrew G. Kirk

http://dx.doi.org/10.1364/IPRA.2006.IWA2


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Abstract

A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. Modeling results predict up to 94% efficiency over a 120nm wavelength range. Early fabrication results, using electron-beam lithography and electron-cyclotron-resonance single-step etching, are presented.

© 2006 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings
(130.0130) Integrated optics : Integrated optics
(130.3120) Integrated optics : Integrated optics devices

Citation
E. Bisaillon, D. T. Tan, J. Laniel, A. Jugessur, L. Chrostowski, and A. G. Kirk, "A Shallow-Etched Distributed-Grating Wavelength Demultiplexer in SOI," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optical Society of America, 2006), paper IWA2.
http://www.opticsinfobase.org/abstract.cfm?URI=IPRA-2006-IWA2


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