A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. Modeling results predict up to 94% efficiency over a 120nm wavelength range. Early fabrication results, using electron-beam lithography and electron-cyclotron-resonance single-step etching, are presented.
© 2006 Optical Society of America
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings
(130.0130) Integrated optics : Integrated optics
(130.3120) Integrated optics : Integrated optics devices
E. Bisaillon, D. T. Tan, J. Laniel, A. Jugessur, L. Chrostowski, and A. G. Kirk, "A Shallow-Etched Distributed-Grating Wavelength Demultiplexer in SOI," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optical Society of America, 2006), paper IWA2.
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