High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers

T. W. Allen; J. Silverstone; N. Ponnampalam; R. G. DeCorby

doi:10.1364/IPRSN.2011.ITuA3

Advanced Photonics
OSA Technical Digest (CD) (Optica Publishing Group, 2011),
paper ITuA3
•https://doi.org/10.1364/IPRSN.2011.ITuA3

High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO₂ Multilayers

T. W. Allen, J. Silverstone, N. Ponnampalam, and R. G. DeCorby

Integrated Photonics Research, Silicon and Nanophotonics 2011

Toronto Canada
12–15 June 2011
ISBN: 978-1-55752-913-8

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Devices and Components II (ITuA)

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T. W. Allen, J. Silverstone, N. Ponnampalam, and R. G. DeCorby, "High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers," in Advanced Photonics, OSA Technical Digest (CD) (Optica Publishing Group, 2011), paper ITuA3.

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Abstract

Micro-cavities were fabricated by controlled formation of delamination buckles within a-Si/SiO₂ multilayers. Linewidth (~0.1 nm in the 1550 nm-range) and finesse (>600) are close to reflectance-limited predictions, indicating low-defect cavities.

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