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Conference Paper
Integrated Photonics Research, Silicon and Nanophotonics
Toronto Canada
June 12-15, 2011
ISBN: 978-1-55752-913-8
Devices and Components II (ITuA)

High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers

Trevor Allen, Josh Silverstone, Ray DeCorby, and Nakeeran Ponnampalam  »View Author Affiliations


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Micro-cavities were fabricated by controlled formation of delamination buckles within a-Si/SiO2 multilayers. Linewidth (~0.1 nm in the 1550 nm-range) and finesse (>600) are close to reflectance-limited predictions, indicating low-defect cavities.

© 2011 OSA

OCIS Codes
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(130.3120) Integrated optics : Integrated optics devices
(130.7408) Integrated optics : Wavelength filtering devices

T. Allen, J. Silverstone, R. DeCorby, and N. Ponnampalam, "High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers," in Advanced Photonics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper ITuA3.

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