Micro-cavities were fabricated by controlled formation of delamination buckles within a-Si/SiO2 multilayers. Linewidth (~0.1 nm in the 1550 nm-range) and finesse (>600) are close to reflectance-limited predictions, indicating low-defect cavities.
© 2011 OSA
T. Allen, J. Silverstone, R. DeCorby, and N. Ponnampalam, "High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers," in Advanced Photonics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper ITuA3.
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