OSA's Digital Library

Optics InfoBase > Conference Papers > IPRSN > 2011 > ITuA > Page ITuA3 © 2011 OSA

Conference Paper
Integrated Photonics Research, Silicon and Nanophotonics
Toronto Canada
June 12-15, 2011
ISBN: 978-1-55752-913-8
Devices and Components II (ITuA)

High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers

Trevor Allen, Josh Silverstone, Ray DeCorby, and Nakeeran Ponnampalam  »View Author Affiliations


http://dx.doi.org/10.1364/IPRSN.2011.ITuA3


View Full Text Article

Acrobat PDF (97 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations
  • Export Citation/Save Click for help

Abstract

Micro-cavities were fabricated by controlled formation of delamination buckles within a-Si/SiO2 multilayers. Linewidth (~0.1 nm in the 1550 nm-range) and finesse (>600) are close to reflectance-limited predictions, indicating low-defect cavities.

© 2011 OSA

OCIS Codes
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(130.3120) Integrated optics : Integrated optics devices
(130.7408) Integrated optics : Wavelength filtering devices

Citation
T. Allen, J. Silverstone, R. DeCorby, and N. Ponnampalam, "High-Finesse Cavities Fabricated by Buckling Self-Assembly of a-Si/SiO2 Multilayers," in Advanced Photonics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper ITuA3.
http://www.opticsinfobase.org/abstract.cfm?URI=IPRSN-2011-ITuA3


Sort:  Journal  |  Reset

References

References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited