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Conference Paper
International Quantum Electronics Conference
San Francisco, California United States
May 16, 2004
ISBN: 1-55752-770-9
Coherent XUV Generation and Applications (JMD)

Damage of Sc/Si multilayer mirrors exposed to intense nanosecond 46.9 nm laser pulses

G. Vaschenko, M. Grisham, C. S. Menoni, J. J. Rocca, Yu. P. Pershyn, E. N. Zubarev, D. L. Voronov, V. A. Sevryukova, V. V. Kondratenko, A. V. Vinogradov, and I. A. Artioukov

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Abstract

The damage threshold fluence (~ 0.08 J/cm2) and damage mechanism of extreme ultraviolet Sc/Si multilayer coatings irradiated by 46.9 nm laser pulses of nanosecond duration are reported.

© 2004 Optical Society of America

OCIS Codes
(230.0230) Optical devices : Optical devices
(230.4170) Optical devices : Multilayers
(340.0340) X-ray optics : X-ray optics
(340.7470) X-ray optics : X-ray mirrors

Citation
G. Vaschenko, M. Grisham, C. S. Menoni, J. J. Rocca, Y. P. Pershyn, E. N. Zubarev, D. L. Voronov, V. A. Sevryukova, V. V. Kondratenko, A. V. Vinogradov, and I. A. Artioukov, "Damage of Sc/Si multilayer mirrors exposed to intense nanosecond 46.9 nm laser pulses," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2004), paper JMD6.
http://www.opticsinfobase.org/abstract.cfm?URI=IQEC-2004-JMD6


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