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Conference Paper
Joint International Symposium on Optical Memory and Optical Data Storage
Kauai, Hawaii United States
July 17-20, 2011
ISBN: 978-1-55752-915-2
ISOM/ODS Poster Session I (OMD)

Thermal mode photo-resistor process discussion and applications

Hsiu-Wen Wu  »View Author Affiliations


http://dx.doi.org/10.1364/ISOM_ODS.2011.OMD21


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Abstract

In this study, we report on use the thermal lithography technology to prepare the submicron structure for antireflection application.

© 2011 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(230.3990) Optical devices : Micro-optical devices
(310.1210) Thin films : Antireflection coatings

Citation
H. Wu, "Thermal mode photo-resistor process discussion and applications," in Nonlinear Optics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper OMD21.
http://www.opticsinfobase.org/abstract.cfm?URI=ISOM_ODS-2011-OMD21


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