OSA's Digital Library

Optics InfoBase > Conference Papers > ISOM_ODS > 2011 > OMD > Page OMD21 © 2011 OSA

Conference Paper
Joint International Symposium on Optical Memory and Optical Data Storage
Kauai, Hawaii United States
July 17-20, 2011
ISBN: 978-1-55752-915-2
ISOM/ODS Poster Session I (OMD)

Thermal mode photo-resistor process discussion and applications

Hsiu-Wen Wu  »View Author Affiliations


View Full Text Article

Acrobat PDF (1090 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


In this study, we report on use the thermal lithography technology to prepare the submicron structure for antireflection application.

© 2011 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(230.3990) Optical devices : Micro-optical devices
(310.1210) Thin films : Antireflection coatings

H. Wu, "Thermal mode photo-resistor process discussion and applications," in Nonlinear Optics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper OMD21.

Sort:  Journal  |  Reset


References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited