Abstract
In this paper, we present a low-cost and high-throughput approach to maskless nanolithography that uses a plasmonic solid immersion lens (SIL) optical head which consists of a SIL and a sharp-ridge nanoaperture for a high strong nanometer-size optical spot. According to the use of the evanescent field generated from SIL for near-field active air-gap control, the plasmonic SIL can fly ~20 nm above a photoresist-coated Si-wafer that moves at speed of 0 ~ 200 mm/s and perform the line patterning with nanometer-size width. We have experimentally demonstrated patterning with a line width (full width at half magnitude: FWHM) of ~130 nm.
© 2011 Optical Society of America
PDF ArticleMore Like This
No-Cheol Park, Yong-Yoong Yoon, Yong-Hyun Lee, Joong-Gon Kim, Wan-Chin Kim, Hyun Choi, Seungho Lim, Hyunseok Yang, Yoon-Chul Rhim, and Young-Pil Park
WA1 Optical Data Storage (ODS) 2007
Liang Pan, Yong-Shik Park, Erick Ulin-Avila, Yi Xiong, Li Zeng, Cheng Sun, David B. Bogy, and Xiang Zhang
OMA3 Joint International Symposium on Optical Memory and Optical Data Storage (ODS) 2011
Wan-Chin Kim, Hyun Choi, TaeSun Song, No-Cheol Park, and Young-Pil Park
WP19 International Symposium on Optical Memory and Optical Data Storage (ODS) 2005