In this paper, we present a low-cost and high-throughput approach to maskless nanolithography that uses a plasmonic solid immersion lens (SIL) optical head which consists of a SIL and a sharp-ridge nanoaperture for a high strong nanometer-size optical spot.
© 2011 OSA
N. Park, B. Min, Y. Park, H. Yang, K. Park, and S. Kang, "Application of SIL based Near Field Recording Technology to High Speed Nano Patterning," in Nonlinear Optics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper OTuA2.
References are not available for this paper.