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Conference Paper
Joint International Symposium on Optical Memory and Optical Data Storage
Kauai, Hawaii United States
July 17-20, 2011
ISBN: 978-1-55752-915-2
Near-field/Plasmonics (OTuA)

Application of SIL based Near Field Recording Technology to High Speed Nano Patterning

No-Cheol Park, Byung-Kwon Min, Young-Pil Park, Hyunseok Yang, Kyoung-Su Park, and Sung-Mook Kang  »View Author Affiliations


http://dx.doi.org/10.1364/ISOM_ODS.2011.OTuA2


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Abstract

In this paper, we present a low-cost and high-throughput approach to maskless nanolithography that uses a plasmonic solid immersion lens (SIL) optical head which consists of a SIL and a sharp-ridge nanoaperture for a high strong nanometer-size optical spot.

© 2011 OSA

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(210.4245) Optical data storage : Near-field optical recording

Citation
N. Park, B. Min, Y. Park, H. Yang, K. Park, and S. Kang, "Application of SIL based Near Field Recording Technology to High Speed Nano Patterning," in Nonlinear Optics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper OTuA2.
http://www.opticsinfobase.org/abstract.cfm?URI=ISOM_ODS-2011-OTuA2


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