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Conference Paper
Laser Science
San Jose, California United States
September 16, 2007
ISBN: 1-55752-846-2
Welcome Reception and Joint FiO/LS Poster Session (JSuA)

Whispering Gallery Modes in Nanosized Silicon Triangular Resonators Fabricated Using Nanosphere Lithography

Andrey Grunin, V. V. Moskalenko, I V. Soboleva, Akihiro A. Fedyanin, C.- M. Lai, and L.- H. Peng

http://dx.doi.org/10.1364/FIO.2007.JSuA42


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Abstract

Excitation means of whispering gallery modes in nanosized silicon triangular resonators is studied. Nanosphere lithography technique with self-assembled polystyrene spheres as shadow masks is used for fabricating periodic arrays of nanosized silicon resonators.

© 2007 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.0230) Optical devices : Optical devices
(230.3990) Optical devices : Micro-optical devices

Citation
A. Grunin, V. V. Moskalenko, I. V. Soboleva, A. A. Fedyanin, C. -. M. Lai, and L. -. H. Peng, "Whispering Gallery Modes in Nanosized Silicon Triangular Resonators Fabricated Using Nanosphere Lithography," in Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion, OSA Technical Digest (CD) (Optical Society of America, 2007), paper JSuA42.
http://www.opticsinfobase.org/abstract.cfm?URI=LS-2007-JSuA42


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