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Conferences > LS > 2008 > JWA > JWA78
  • Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper JWA78
  • •https://doi.org/10.1364/FIO.2008.JWA78

Effect of Etched Sidewall Tilt on the Reflection Loss of Silicon-on-Insulator (SOI) or III-V Etched Facet Reflector

Yunan Zheng, Yingyan Huang, and Seng-Tiong Ho

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Abstract

The effect of etching’s verticality on the reflection loss of strongly-guiding SOI or weakly-guiding III-V etched facet reflector (EFR) is studied. High tolerance on tilt makes SOI EFR much more resilient to etching deviation.

© 2008 Optical Society of America

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