Patterning and Imaging at the Nanoscale with Far-field Optics via Absorbance Modulation

Rajesh Menon; Hsin-Yu Tsai; Henry I. Smith

doi:10.1364/META.2007.WA3

Photonic Metamaterials: From Random to Periodic
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper WA3
•https://doi.org/10.1364/META.2007.WA3

Patterning and Imaging at the Nanoscale with Far-field Optics via Absorbance Modulation

Rajesh Menon, Hsin-Yu Tsai, and Henry I. Smith

Photonic Metamaterials: From Random to Periodic 2007

Jackson Hole, Wyoming United States
4–7 June 2007
ISBN: 1-55752-839-X

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Nanophotonics and Meta (WA)

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R. Menon, H. Tsai, and H. I. Smith, "Patterning and Imaging at the Nanoscale with Far-field Optics via Absorbance Modulation," in Photonic Metamaterials: From Random to Periodic, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper WA3.

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Abstract

By illuminating an absorbance-modulation layer with a null at one wavelength, and a focused spot at another wavelength, it is possible to overcome the diffraction limit. We present preliminary experimental results, and rigorous theoretical simulations.

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