OSA's Digital Library

Optics InfoBase > Conference Papers > NANO > 2006 > NWB > Page NWB1 © 2006 OSA

Conference Paper
Uncasville, Connecticut United States
April 26, 2006
Photonic Crystals II (NWB)

S-FIL Patterning of Photonics Substrates with Photonic Crystal Structures

Chris Jones, David Wang, and Dwayne LaBrake


View Full Text Article

Acrobat PDF (426 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


SFIL/R patterning has been used to pattern 100 nm photonic crystal structures on substrates commonly used in the photonics industry. A lithography process is demonstrated through hard mask patterning including on die patterned wafers.

© 2006 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(230.0230) Optical devices : Optical devices
(230.4000) Optical devices : Microstructure fabrication

C. Jones, D. Wang, and D. LaBrake, "S-FIL Patterning of Photonics Substrates with Photonic Crystal Structures," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optical Society of America, 2006), paper NWB1.

Sort:  Journal  |  Reset


References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited