SFIL/R patterning has been used to pattern 100 nm photonic crystal structures on substrates commonly used in the photonics industry. A lithography process is demonstrated through hard mask patterning including on die patterned wafers.
© 2006 Optical Society of America
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(230.0230) Optical devices : Optical devices
(230.4000) Optical devices : Microstructure fabrication
C. Jones, D. Wang, and D. LaBrake, "S-FIL Patterning of Photonics Substrates with Photonic Crystal Structures," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optical Society of America, 2006), paper NWB1.
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