Author Affiliations

L.K. Oxenløwe,^(1),* F. Gomez Agis,⁽²⁾ C. Ware,⁽²⁾ S. Kurimura,⁽³⁾ H.C.H. Mulvad,⁽¹⁾ M. Galili,⁽¹⁾ K. Kitamura,⁽³⁾ H. Nakajima,⁽⁴⁾ J. Ichikawa,⁽⁵⁾ D. Erasme,⁽²⁾ A.T. Clausen,⁽¹⁾ and P. Jeppesen⁽¹⁾

⁽¹⁾DTU Fotonik, Technical University of Denmark, Building 343, DK-2800 Kgs. Lyngby, Denmark

⁽²⁾Institut TELECOM, TELECOM ParisTech, LTCI CNRS, 46 rue Barrault, 75634 Paris CEDEX 13, France

⁽³⁾National Institute for Materials Science, 1-1, Namiki, Tsukuba 305-0044, Japan

⁽⁴⁾Graduate School of Science and Technology, Waseda University, 3-4-1, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

⁽⁵⁾New Technology Research Laboratories, Sumitomo Osaka Cement Co. Ltd. 585, Toyotomi-cho, Funabashi-shi, Chiba 274-8601, Japan

^*Corresponding author: lo@com.dtu.dk